Electro Optics· James Wormald·· 2 days agoAI score55
Optics industryOptics and AISiemens Says EUV Lithography Simulation Speeds Up by More Than 10x
Siemens reports over 10 times faster EUV lithography simulation with new technique
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A new technology developed by Siemens in collaboration with NVIDIA accelerates EUV computational lithography simulation by more than 10x, supporting complex patterning for advanced AI chips.
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The company says its collaboration with Nvidia will help speed up computational lithography methods and support complex patterning for advanced AI chips
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Source: Electro Optics · electrooptics.com